WH-XQY-01 Spray developing cleaning machine

1. Product introduction

The developing and cleaning all-in-one machine (WH-XQY-01) is a product independently developed by Wenhao Co., Ltd. with independent intellectual property rights. It is designed and developed for the development and cleaning process in the photolithography process and can be programmed and automated to develop and clean. This equipment can completely replace the manual development and cleaning steps in the production process of microfluidic chips, and overcome the uncontrollable amount of developer added in the manual development process, uncontrollable silicon wafer development time, and uncontrollable development effect between silicon wafers of the same specification, etc. Disadvantages, to minimize the development quality problems caused by the operator’s human factors and the damage of the silicon wafer.

2. Technical parameters

Speed: 0~3000 rpm

Developer volume control: 10~450 mL

Cleaning time control: 0~900 s

Silicon wafer/chip: ≤7 inches

Development time control: 1~900 s

Liquid feeding speed: 30~100%

Power input: AC220V±10V/50HZ

Power: 250W

Weight: 20 kg

Dimensions: 410 (W) * 410 (D) * 350 (H) mm

Working environment: temperature 0℃-40 ℃, relative humidity <80%

 Spray developing cleaning machine

Spray developing cleaning machine


Leave a Reply