Product:
The etching thickness of AZ photoresist ranges from 1 μm to 150 μm and more. High sensitivity, high yield, high adhesion, especially for wet etching process improvement, widely used in the global semiconductor industry.
Type and parameter of photoresist
Name of photoresist | Type | Spin coator thickness |
Merck AZ Positive/negative interchangeable photoresist | AZ 5214 | 0.5-6um |
AZ 50XT Positive glue | AZ 50XT | 40-80um |
AZ 9260 Positive glue | AZ 9260 | 6.2-15um |
AZ 4620 Photoresist | AZ 4620 | 10-15um |
MicroChem SU-8 negative glue | SU-8 2015 | 13-38um |
MicroChem SU-8 negative glue | SU-8 2050 | 40-170um |
MicroChem SU-8 negative glue | SU-8 2075 | 60-240um |
MicroChem SU-8 negative glue | SU-8 2150 | 190-650um |
MicroChem SU-8 negative glue | SU-8 3010 | 8-15um |
MicroChem SU-8 negative glue | SU-8 3050 | 44-100um |