AZ 50XT photoresist

Product:

The etching thickness of AZ photoresist ranges from 1 μm to 150 μm and more. High sensitivity, high yield, high adhesion, especially for wet etching process improvement, widely used in the global semiconductor industry.

 

Type and parameter of photoresist

Name of photoresist Type Spin coator thickness
Merck AZ Positive/negative interchangeable photoresist AZ 5214 0.5-6um
AZ 50XT  Positive glue AZ 50XT 40-80um
AZ 9260 Positive glue AZ 9260 6.2-15um
AZ 4620 Photoresist AZ 4620 10-15um
MicroChem SU-8 negative glue SU-8 2015 13-38um
MicroChem SU-8 negative glue SU-8 2050 40-170um
MicroChem SU-8 negative glue SU-8 2075 60-240um
MicroChem SU-8 negative glue SU-8 2150 190-650um
MicroChem SU-8 negative glue SU-8 3010 8-15um
MicroChem SU-8 negative glue SU-8 3050 44-100um

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